6. Materials and Processes for Silicon Technology

6.1 Silicon

6.1.1 Producing Semiconductor-Grade Silicon

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6.1.2 Silicon Crystal Growth and Wafer Production

6.1.3 Uses of Silicon Outside of Microelectronics

6.1.4 Summary to: 6.1 Materials and Processes for Silicon Technology

6.2 Si Oxides and LOCOS Process

6.2.1 Si Oxide

6.2.2 LOCOS Process

6.2.3 Summary to: 6.2 Si Oxide and LOCOS Process

6.3 Chemical Vapor Deposition

6.3.1 Silicon Epitaxy

6.3.2 Oxide CVD

6.3.3 CVD for Poly-Silicon, Silicon Nitride and Miscellaneous Materials

6.3.4 Summary to: 6.3 Chemical Vapor Deposition

6.4. Physical Processes for Layer Deposition

6.4.1 Sputter Deposition and Contact Hole Filling

6.4.2 Ion Implantation

6.4.3 Miscellaneous Techniques and Comparison

6.5 Etching Techniques

6.5.1 General Remarks

6.5.2 Chemical Etching

6.5.3 Plasma Etching

6.6 Lithography

6.6.1 Basic Lithography Techniques

6.6.2 Resist and Steppers

6.7 Silicon Specialities

6.7.1 Electrochemistry of Silicon


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© H. Föll (Electronic Materials - Script)