Formation of the metal or alloy nanoparticles in a gas aggregation cluster source combined with an arbitrary deposition technique for the ceramic or polymer matrix
Sputtering at a high gas pressure leads to formation of nanoparticles in the gas phase. In our group we have developed Haberland-type gas aggregation sources based on magnetron sputtering. Different to other or commercially available clusters sources, our sources allow deposition of nanoparticles with a high rate and tailored size distribution. Inter alia, we enhance the deposition rate by reactive pulsed DC magnetron sputtering and HIPIMS (high power impulse magnetron sputtering) as well as the addition of trace amounts of reactive metals. In a cluster source, the nanoparticles form in the gas phase and not on the surface of the growing composites. This, among other advantages, allows chemical reactions between the metallic component and the matrix to be widely eliminated. Moreover, the source also allows to deposit highly porous films made up of aggregated nanoparticles. In connection with our activities in the field of functional nanocomposites, a key advantage of nanoparticle generation in a separate cluster source is the independent control of nanoparticle size and filling factor. Thus, applying co-deposition of the matrix, e.g. by magnetron sputtering or plasma polymerization, we are able to prepare highly filled metal-dielectric nanocomposites even with very small nanoparticles. Here the properties result from the interaction of neighboring nanoparticles on the nanoscale (see, e.g. plasmonic and magnetic nanocomposites). The cluster sources can also be used to prepare alloy or mixed oxide nanoparticles with well-defined composition. Our gas aggregation cluster sources are equipped with in-situ diagnostics and control.
One of our cluster sources mounted a vacuum chamber for combination with different deposition techniques for the polymer of ceramic matrix.
Independent of the preparation of functional nanocomposites, we study nanoparticle generation in plasmas within the Projects B13 and B15 of the Collaborative Research Unit SBF TR24 “Fundamentals of Complex Plasmas” from the more fundamental point of view. Here we cooperate with Prof. Holger Kersten from the physics department whose group contributes with advanced plasma diagnostics.
For selected publications see the following links:
Selected earlier publications
Ahadi, A. M.; Hinz, A.; Polonskyi, O.; Trottenberg, T.; Strunskus, T.; Kersten, H.; Faupel, F.; Modification of a metal nanoparticle beam by a hollow electrode discharge, Journal of Vacuum Science & Technology A 34 (2016) .
Ahadi, A. M.; Zaporojtchenko, V.; Peter, T.; Polonsky, O.; Strunskus, T.; Faupel, F.: Role of oxygen admixture in stabilizing TiOx nanoparticle deposition from a gas aggregation source, Journal of Nanoparticle Research 15 (2013) 2125.
Polonsky, O.; Peter, T.; Zaporojtchenko, V.; Biedermann, H.; Faupel, F.: Huge increase in gas phase nanoparticle generation by pulsed direct current sputtering in reactive gas admixture, Applied Physics Letters 103 (2013) 033118.
Peter, T.; Rehders, S.; Schürmann, U.; Strunskus, T.; Zaporojtchenko, V.; Faupel, F.: High Rate Deposition System for Metal-Cluster /SiOxCyHz - Polymer Nanocomposite Thin Films, Journal Nanoparticle Research (2013) DOI 10.1007/s11051-013-1710-6.
Peter, T.; Polonsky, O.; Gojdka, B.; Ahadi, A.M.; Strunskus, T.; Zaporojtchenko, V.; Biederman, H.; Faupel, F.: Influence of reactive gas admixture on transition metal cluster nucleation in a gas aggregation cluster source, Journal of Applied Physics 112 (2012) 114321.
Gojdka, B.; Zaporojtchenko, V.; Hrkac, V.; Xiong, J.; Kienle, L.; Strunskus, T.; Faupel, F.: Highly versatile concept for precise tailoring of nanogranular composites with a gas aggregation cluster source, Applied Physics Letters Vol. 100 Issue 13 (2012) 133104.
B. Gojdka, V. Hrkac, T. Strunskus, L. Kienle, F.Faupel, Nanotechnology 22, 465704 (2011).