Intended Topics | |||
4.1 Silicon on Insulator | |||
General advantages and problems, basic device structure | |||
Modern developments Oxygen Implantation; waferbonding, smart cut technology |
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4.2 Etching of Silicon | |||
Chemical etches Isotropic and anisotropic dissolution, defect etches and anodic etching | |||
Micromechanics and microsystem technology Basic considerations, special process steps |
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Electrochemical etching, Porous Silicon and applications Photonic crystals, filters, sensors, microtechnology, integrated wave guides, ... | |||
4.3 Specialities | |||
Amorphes Si and applications Structural and electronic properties, H - passivation, solar cells and FPDs | |||
SiGe: Materials ascpects and devices HEMT, detectors (incl. Ge), | |||
© H. Föll (Semiconductors - Script)