Kolloquiumsvortrag, Dr. Jörg Hübner, Technical University of Denmark / 30.05.2016
30.05.2016 von 17:15 bis 18:45
Institut Ostufer, Kaiserstraße 2, 24143 Kiel, Raum: Geb. D, "Aquarium"
Titel: Micro and Nano structuring of Silicon at DTU Danchip.
Abstract: Etching of silicon is the basic technology step for a large variety of MEMS, NEMS and microfluidic applications. Even the fabrication of large area nanostructure in polymere starts in our examples with lithography and etch of silicon. The talk will therefore after a short introduction to DTU Danchip focus on plasma etching of silicon. The plasma chemistry and physics during silicon etch poses challenges and opportunities, which will be using examples reaching from nanopillars for SERS enhancement to X-ray compound lenses. There will also be a short excursion into Atomic Layer Deposition and some results on structures realised with this very versatile technology.