Kolloquiumsvortrag: Prof. Dr. Joachim Schnadt, Universität Lund, Schweden / 18.01.16

18.01.2016 von 17:15 bis 18:45

Institut für Materialwissenschaft, Kaiserstr. 2, 24143 Kiel, Geb. D Raum: "Aquarium"

Titel:  (Near-) Ambient pressure x-ray photoelectron spectroscopy: studying surface chemical processes under realistic conditions and in real time


Surface chemical processes play a ubiquitous role in our lives, whether this be in industrial catalytic processes, controlled oxide and metal growth processes of so great importance for e.g. the semiconductor industry, or chemical reactions in our bodies: surfaces are always involved. To investigate surface chemical processes there exists a large arsenal of surface-sensitive techniques, and among them many spectroscopies which can deliver elemental, chemical, and electronic information. However, in their conventional form most surface-sensitive spectroscopy techniques, such as x-ray photoelectron spectroscopy and x-ray absorption spectroscopy, are limited to vacuum environments, which prevents the study of ongoing surface chemical processes and which leads to decisive information being missed. Ambient pressure x-ray photoelectron spectroscopy has been adapted instrumentally to allow realistic or close-to realistic pressures and thus allows in situ and operando investigations of surface chemical processes. I will introduce the technique and present cases from the areas of atomic layer deposition (ALD) and chemical vapour deposition (CVD), aimed at gaining a true understanding of what is going on during the growth of oxide layers on semiconductors.

Prof. Selhuber-Unkel

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