### 4.1.2 Modern Developments

| Intended Topics
| 4.1 Silicon on Insulator
|  | General advantages and problems, basic device structure
|  | Modern developments Oxygen Implantation; waferbonding, smart cut technology
| 4.2 Etching of Silicon
|  | Chemical etches Isotropic and anisotropic dissolution, defect etches and anodic etching
|  | Micromechanics and microsystem technology Basic considerations, special process steps
|  | Electrochemical etching, Porous Silicon and applications Photonic crystals, filters, sensors, microtechnology, integrated wave guides, ...
| 4.3 Specialities
|  | Amorphes Si and applications Structural and electronic properties, H - passivation, solar cells and FPDs
|  | SiGe: Materials ascpects and devices HEMT, detectors (incl. Ge),

© H. Föll (Semiconductors - Script)